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Mitsubishi Gas Chemical building new US wafer cleaner plants

$60m investment will double company's output in America

TOKYO -- Mitsubishi Gas Chemical will establish two new American plants by 2019 that will double its U.S. output of a chemical used to clean semiconductor wafers.

North American semiconductor makers are ramping up orders for super-pure hydrogen peroxide, which is required in the chipmaking process. Advanced chips are in high demand with the spreading use of technologies such as artificial intelligence and the "internet of things."

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