Dai Nippon Printing to mass produce photomasks for Rapidus chip

Company to invest $330m, enter domestic 2-nm semiconductor supply chain

20240326 photomask

A photomask. Dai Nippon Printing participated as a subcontractor in a Rapidus project sponsored by the Japanese government.

KYOKO HARIYA, Nikkei staff writer

TOKYO -- Dai Nippon Printing will begin mass producing photomasks, used in printing semiconductor circuits, in Japan in fiscal 2027 for Rapidus, which aims to produce cutting-edge semiconductors domestically.

The company will invest an estimated 50 billion yen ($330.3 million) to develop and mass-produce photomasks for 2-nanometer products. Photomasks are plates that let light shine through and bake circuits onto the silicon wafers that act as semiconductor substrates.

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