TOKYO -- Toshiba will spend roughly 100 billion yen ($873 million) to build a power semiconductor fabrication facility in Japan, with production expected to begin by March 2025, Nikkei has learned.
$870m fab set to debut by 2025 as part of broader capacity boost

Toshiba's new fabrication facility will be built on the grounds of a chipmaking subsidiary in Ishikawa Prefecture. (Image courtesy of Toshiba Electronic Devices & Storage)
TOKYO -- Toshiba will spend roughly 100 billion yen ($873 million) to build a power semiconductor fabrication facility in Japan, with production expected to begin by March 2025, Nikkei has learned.